As design nodes drop below 45nm, design rules are exploding in number and complexity, making design rule checking (DRC) harder and lengthier. What we have observed across the industry is that the ...

Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.

Take advantage of the new relational and logical patterns in C# 9.0 to make your code more readable, maintainable, and efficient. Pattern matching is a great feature first introduced in C# 7. You can ...

This file type includes high resolution graphics and schematics. IC physical verification (i.e., design rule checking or “DRC”) used to be easy. In the good old days, you could run some ...