TL;DR: TSMC will not use High-NA EUV lithography for its next-gen A14 (1.4nm) process in 2028, opting for conventional 0.33-NA EUV machines to maintain cost efficiency and complexity. This decision ...
TSMC reiterated its long-known stance on next-generation High-NA EUV lithography tools at its European Technology Symposium in Amsterdam. The company does not require these highest-end lithography ...
Nvidia has developed a software library for computational lithography, which it believes will massively improve chip design development times, and reduce the number of data centers chip fabs have to ...
Nvidia's cuLitho software library is being used by TSMC and Synopsys for production chip development. GPU designer Nvidia announced the computational lithography library this time last year, saying ...
Why it matters: As the industry's leading foundry, TSMC's approach to reducing the energy intensity of cutting-edge chip production will likely influence how other semiconductor manufacturers pursue ...
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