TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required for photomasks for logic semiconductors of the beyond 2nm (nm: ...

SAN JOSE, Calif. &#151 Lam Research Corp. has rolled out the 2300 Motif, a post-lithography pattern enhancement system. Based on a proprietary plasma-assisted process, the new system delivers ...

A new startup has emerged and unveiled a technology that addresses one of the bigger but less understood problems in advanced lithography–pattern roughness. The startup, called Fractilia, is a ...

To build optoelectronic circuits, researchers need to make films of semiconductor nanocrystals in desired patterns, just as they can with conventional silicon-based electronics. But the techniques ...

The ability to create intricate, nano-scale patterns is at the heart of nanotechnology, and lithography techniques are the tools that make this possible. From photolithography to FIB, each technique ...

Photoresist and underlayer combine to serve a central role in EUVL for patterning. Layers will be very thin in future, because high numerical aperture (NA) and tight pitches will require very thin ...

Soft lithography facilitates the fabrication of intricate three-dimensional patterns and structures at both microscale and nanoscale dimensions. Diverging from photolithography, a technique commonly ...

YOKOHAMA—After a decade of development, Canon Inc. began selling lithography equipment for semiconductor production, hoping to reclaim a share in the market. The equipment is used to print fine ...

And it’s unlikely that many of the other labs currently trying to harness the potential of graphene, a single-atom sheet of carbon, for microelectronics would have come up with the technique the Rice ...

MOUNTAIN VIEW, Calif., Feb. 7, 2013-- Synopsys, Inc. (Nasdaq: SNPS), a global leader providing software, IP and services used to accelerate innovation in chips and electronic systems, today announced ...