Conventional silicon-based electronics are rapidly approaching a fundamental barrier. Below about five nanometers, quantum effects make their behavior unpredictable. That’s led to research into ...
(Nanowerk News) The National Institute for Advanced Industrial Science and Technology (AIST) and Tohoku University have succeeded in manufacturing a high-performance upright-type double gate MOS ...
For more than a decade, engineers have been eyeing the finish line in the race to shrink the size of components in integrated circuits. They knew that the laws of physics had set a 5-nanometer ...
Side-wall MoS 2 transistors with an atomically thin channel and a physical gate length of sub-1 nm using the edge of a graphene layer as the gate electrode Find the technical paper link here.
A team of scientists from the Institute for Basic Science has developed a revolutionary technique for producing 1D metallic materials with a width of less than 1 nm by epitaxial growth. Using this ...
N-MOS and P-MOS transistors are analogous respectively to NPN and PNP transistors but their conduction mechanism is based completely on one type of carrier: holes for the PMOS and electrons for the ...
When they were first commercialized at the 22 nm node, finFETs represented a revolutionary change to the way we build transistors, the tiny switches in the “brains” of a chip. As compared to prior ...
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